Intel Corporation announced an investment of between $1 billion to $1.5 billion in its fourth factory scheduled to use the 45nm process: the Rio Rancho Fab 11X site. The production in New Mexico is scheduled to start in the second half of 2008. Fab 11X began production in October 2002 and currently manufactures 90nm computer chips on 300mm wafers. Fab 11X was Intel's first fully automated 300mm high-volume manufacturing facility. Intel's 45nm high-k and metal gate process consists of an innovative combination of new transistor materials that reduces transistor leakage and increases performance. First commercial 45nm chips from Intel are expected in the second half of 2007.
"Our new 45 nanometer process represents one of the most significant manufacturing breakthroughs in decades and we believe that putting it in our factory in New Mexico will help us deliver the best possible products for our customers. Our Rio Rancho site has successfully operated in New Mexico for 27 years. Based on that success, we are pleased to position Fab 11X for Intel's next generation of technology," said Paul Otellini, Intel Corporation's president and CEO.
News source: Xbit Laboratories